HAN'S LASER LPCVD Coating machine

HAN'S LASER LPCVD Coating machine

  • HAN'S LASER LPCVD Coating machine
  • HAN'S LASER LPCVD Coating machine
Summary
HAN'S LASER LPCVD (Low-Pressure Chemical Vapor Deposition) Coating Machine represents the pinnacle of technological innovation tailored specifically for the demanding semiconductor and photovoltaic industries. Designed with precision and versatility in mind, this cutting-edge equipment revolutionizes production processes, particularly in the TOPCon (Tunnel Oxide Passivated Contact) process cells within the photovoltaic sector.More
Specifications
Types of film f:
ormationSiOX , i/d-Poly-Si
Loading size:
Vertical loading method: 1400 pcs/ batch(182mm) , 1200片/ batch(210mm)
Horizontal loading method: 2000 pcs/ batch(182mm) , 1800pcs/ batch(210mm)
  • HAN'S LASER LPCVD Coating machine

Core Competencies & Application Focus

  • Ideal for high-efficiency solar cell manufacturing,LPCVD Coating Machine seamlessly integrates the preparation of both tunnel oxide layers and poly layers in a single, streamlined process. This one-stop solution significantly enhances production capabilities while maintaining compatibility with advanced i/d-Poly growth processes, ensuring a seamless transition to more efficient production lines.

Key Features & Technical Advantages

  • High-Capacity Process Maturity: Boasting a proven, high-capacity process, the machine ensures reliability and consistency in large-scale production environments.

  • Dual-Mode Temperature Control: Incorporating advanced dual- control technology, it achieves precise and stable temperature regulation, critical for optimal film deposition quality.

  • Film Gauge Protection: A unique film gauge protection technology safeguards against potential defects, ensuring every layer meets the highest quality standards.

  • Diverse Coating Technologies: The machine supports a versatile range of coating technologies, including multi-layer composite films and doped polysilicon, catering to diverse manufacturing requirements.

Conclusion

HAN'S LASER LPCVD Coating Machine is the ultimate choice for manufacturers seeking to elevate their semiconductor and photovoltaic production capabilities. With its blend of advanced technologies, proven process maturity, and comprehensive safety features, it empowers businesses to achieve greater efficiency, precision, and scalability in their production lines. Contact us today to discover how HAN'S LASER LPCVD Coating Machine can transform your manufacturing processes.

 
Technical Specifications:

Item Technical Parameter
Types of film formation SiOX , i/d-Poly-Si
Loading size Vertical loading method: 1400 pcs/ batch(182mm) , 1200片/ batch(210mm)
Horizontal loading method: 2000 pcs/ batch(182mm) , 1800pcs/ batch(210mm)
Film thickness uniformity SiOx uniformity: Adjustable thickness from 1-3nm, with 0.1nm precision, the thickness of SiOx is tested by polishing sheet;
Poly uniformity: Adjustable thickness 50-200nm, with 0.1nm precision, the thickness of Poly thickness is tested by polishing sheet, within sheet: ≤4%,; between sheets≤4%; between batches ≤3% (>100nm)
UP -TIME ≥95%
Range of working temperature 400-750 °C
Temperature Control 6-point temperature control, internal and external dual-mode control
Heating method Automatic slope heating and fast constant temperature function
Cooling method The latest patented technology, 6 temperature zone section control active cooling furnace body
Accuracy and length of constant temperature zone ± 1℃ (550-700 ℃)
Warming-up time RT 750 °C ≤ 45 min
Cooling rate ≥ 5℃ /min
Temperature control Dual-mode precise control 1000mm/min continuously adjustable; Positioning accuracy ≤±1 mm;
The ultimate vacuum of the system <3Pa
System air leak rate The rate of pressure rise after the pump is stopped and the valve is closed< 2 Pa /min
Pressure control method Quickly adjust fully automatic closed loop
Process control method Process automatic control, multiple safety chain alarms
Human-computer interface LCD display, touch operation, process editing, online monitoring, authority management, team management, networking function
MES Equipped
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