HAN'S LASER PECVD

HAN'S LASER PECVD

  • HAN'S LASER  PECVD
  • HAN'S LASER  PECVD
Summary
HAN'S LASER PECVD (Plasma Enhanced Chemical Vapor Deposition) represents the cutting-edge technology in solar cell manufacturing, designed to significantly enhance the performance of crystalline silicon cells, particularly PERC (Passivated Emitter and Rear Cell) and TOPCon (Tunnel Oxide Passivated Contact) architectures. This innovative system deposits a high-quality anti-reflection silicon nitride film (SixNy), tailored energy conversion efficiency.More
Specifications
Types of film formation:
SiO、SiON 、SiN
Loading size:
210mm(166mm,182mm,230mm can be  compatible)
Loading capacity:
680pcs/batch (166mm)
620pcs/batch (182mm)
504pcs/batch (210mm)
432pcs/batch (230mm)
  • HAN'S LASER  PECVD

Core Functionality & Unique Advantages

  • Enhanced Anti-Reflection Layer
  • The HAN'S LASER PECVD deposits a precise layer of silicon nitride film (SixNy) with a thickness ranging from 75 to 140 nanometers on the surface of silicon wafers. This film not only effectively reduces light reflection, maximizing the amount of sunlight absorbed by the cell, but also passivates both the surface and interior of the wafer through the utilization of active H+ during the deposition process. This dual-benefit mechanism directly translates into improved minority carrier lifetime of silicon wafers, leading to a notable boost in the conversion efficiency of crystalline silicon cells.

Key Parameters & Technical Highlights

  • High-Capacity & Advanced Process: Boasting a mature high-capacity process, HAN'S LASER PECVD incorporates dual-mode temperature control technology and film gauge protection technology, ensuring precise and consistent film deposition.

  • Patented Push-Pull Mechanism: Supported at both ends, mechanism eliminates jitter, enhances speed by 30%, increases load capacity, and significantly improves operational reliability. Boat entry and exit times are optimized to no more than 20 seconds (excluding boat handling).

  • Rapid Cooling Furnace Body: Featuring the latest patented technology, the furnace body rapidly cools down to the desired temperature, achieving over 25% increase in cooling rate. This improvement significantly enhances temperature uniformity within the furnace tube.

  • Innovative Boat Storage Cooling: The patented parallel heat dissipation method storage positions improves cooling efficiency, reducing cooling time by more than 15%. Additionally, it optimizes air intake flow to maintain superior internal cleanliness of the console.

Conclusion

HAN'S LASER PECVD stands as a testament to the convergence of advanced materials science, precision engineering, and automation in the realm of solar cell manufacturing. Its ability to deposit superior quality anti-reflection silicon nitride films, coupled with its robust design and innovative features, positions it as the go-to solution for manufacturers seeking to elevate the efficiency and their PERC/TOPCon cell production lines. Embrace the future of solar energy with HAN'S LASER PECVD.

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